The unprocessed Epitaxial Wafers of class 30% contain our high-efficiency GaInP/GaAs/Ge based epitaxial layers on a Ge substrate. These epixial wafers can be used for any further processing and customized cell designs.
Design and Mechanical Data
Substrate Material :GaInP/GaInAs/Ge on Ge substrate Base Material :100 mm ±0.20
Thickness :145 μm ±15 μm or 175 μm ±15 μm
Major Flat length :32.5 mm ±2 mm
Major Flat orientation:(100) ±2°
Average Weight :≤ 93 mg/cm2
Laser mark label:Alpha-numeric